JPH0550849B2 - - Google Patents

Info

Publication number
JPH0550849B2
JPH0550849B2 JP60021373A JP2137385A JPH0550849B2 JP H0550849 B2 JPH0550849 B2 JP H0550849B2 JP 60021373 A JP60021373 A JP 60021373A JP 2137385 A JP2137385 A JP 2137385A JP H0550849 B2 JPH0550849 B2 JP H0550849B2
Authority
JP
Japan
Prior art keywords
wavelength
optical system
imaging magnification
illumination light
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60021373A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61181128A (ja
Inventor
Takamasa Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60021373A priority Critical patent/JPS61181128A/ja
Publication of JPS61181128A publication Critical patent/JPS61181128A/ja
Priority to US07/212,145 priority patent/US4811055A/en
Publication of JPH0550849B2 publication Critical patent/JPH0550849B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60021373A 1984-02-27 1985-02-06 投影露光装置及び投影露光方法 Granted JPS61181128A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60021373A JPS61181128A (ja) 1985-02-06 1985-02-06 投影露光装置及び投影露光方法
US07/212,145 US4811055A (en) 1984-02-27 1988-06-24 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60021373A JPS61181128A (ja) 1985-02-06 1985-02-06 投影露光装置及び投影露光方法

Publications (2)

Publication Number Publication Date
JPS61181128A JPS61181128A (ja) 1986-08-13
JPH0550849B2 true JPH0550849B2 (en]) 1993-07-30

Family

ID=12053287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60021373A Granted JPS61181128A (ja) 1984-02-27 1985-02-06 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JPS61181128A (en])

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63213928A (ja) * 1987-03-03 1988-09-06 Canon Inc 露光装置
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus
JP2590891B2 (ja) * 1987-07-02 1997-03-12 株式会社ニコン 投影光学装置
DE3733823A1 (de) * 1987-10-07 1989-04-20 Zeiss Carl Fa Verfahren zur kompensation des einflusses von umweltparametern auf die abbildungseigenschaften eines optischen systems
US7525638B2 (en) 2005-03-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JPS61181128A (ja) 1986-08-13

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term